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Thin Film Analyzer

Technical Concept

The thin film analyzer is a non-contact analysis technology that uses a light source to vertically shine onto the sample and detect the reflection spectra.

No further sample preparations are needed for thickness measurements and the technology can be fitted to semi-transparent samples. The thin film thickness is determined by analyzing the reflected light. This technology can also determine the thicknesses of multi-layer thin films.




  1. Thin film thickness measurement
  2. Multi-layer thin films thickness measurement
  3. Can be also applied to thickness measurement on dielectric, oxide, metal, organic, and inorganic thin films
  4. Minimum measurement dimension: 10 um
  5. Measurement range: 20 nm to 20 um





Filmetrics F40





Application Case

Single thin film thickness measurement, SiO2: 316.38 nm

Multi-layer thin film thickness measurement, Si: 614.2 nm/W: 54.63 nm/Si3N4: 122.4 nm





Taiwan Lab

Mr. Liu

: +886-3-6116678 ext:3972/3966

: +886-952-303-813


Shanghai Lab

Mr. Yang

: +86-21-5079-3616 ext:7201

: 137-6486-2001

: sims_sh@ma-tek.com