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IC Design

An integrated circuit (IC) is a technology that integrates a large number of electronic components (such as transistors, resistors, capacitors, etc.) onto a single silicon substrate through miniaturization and layout techniques, allowing the chip to perform high-speed computing, data processing, or control functions in a very small area.

IC design is the process of establishing circuit architecture, logical behavior, and physical layout based on product functions, performance requirements, power consumption targets, and process specifications, ultimately outputting design files (such as GDS) that can be used for wafer manufacturing. As semiconductor processes advance to 7nm, 5nm, 3nm, and more advanced nodes, along with the rapid maturation of heterogeneous integration, Chiplet, 2.5D/3D IC, and advanced packaging technologies, the scope of IC design is no longer limited to the circuit logic itself but must also consider:

 

1. Process feasibility of materials and structures

2. Metal layer, dielectric layer stacking and wiring density

3. Signal Integrity (SI), Power Integrity (PI) and Thermal Design

4. The impact of packaging and system integration on performance and lifespan

5. Long-term reliability and performance degradation in the usage environment

 

Therefore, IC design needs to balance performance, power consumption, size, cost, and reliability, and ensure that the chip can maintain the expected electrical characteristics and operational behavior after entering manufacturing and packaging.

 

Application Examples
Applicable Services
Service Categories Analysis/Test Can confirm/Can locate content MA-tek provides technology
Material and Structural Analysis (MA) Verify whether the chip structure meets design and process requirements. metal layer thickness, dielectric layer morphology, wiring density, via/contact structure, interface quality TEM, STEM, FIB, SEM, EDS, EELS

Failure Analysis

(FA)

Identify the sources of open circuits, short circuits, or abnormal electrical properties. via void, crack, metal migration, electrical leakage, interface delamination, stress effects caused by packaging OBIRCH, TIVA, X-ray, SAM, Decap, Passive Probe

Reliability Verification

(RA)

Evaluate the lifespan and stability of chips under usage environments. Metal migration, dielectric layer breakdown, thermal aging, mechanical fatigue, packaging thermal stress effects HTOL, EM, TDDB, BTI, TC, HAST, HTS
Common Questions
Q1. Why is the yield inconsistent with expectations after tape-out?
A. There may be differences between the design model, process conditions, and material properties, leading to open circuits, short circuits, or leakage phenomena in metal layers, dielectric layers, or contact structures. To determine the source of anomalies, precise localization and analysis of the internal structure and interface conditions of the chip are required.
Q2. Why is the electrical performance of the chip different after packaging compared to the design phase?
A. The RDL, Bump, Underfill, soldering conditions, and thermal distribution after packaging may change the internal stress, signal delay, and power integrity of the chip, resulting in measurement values that differ from the design phase. Therefore, it is necessary to compare the structural differences before and after packaging to confirm whether the interface degradation or wiring structure is affected due to packaging materials or processes.
Q3. How to confirm the cause of performance degradation after long-term use of the chip?
A. Chip performance degradation is often related to metal migration, dielectric layer aging, thermal cycling fatigue, and interface stress accumulation. It is necessary to quantify the degradation process through accelerated life testing and compare the structures before and after to establish the degradation mechanism.
Q4. How to avoid performance differences when switching between different foundries or process versions?
A. Differences in material sources, processing parameters, and equipment conditions may cause electrical inconsistency, especially in advanced processes or multi-site supply chain collaborations. It is necessary to ensure cross-factory/cross-batch reproducibility through structural and electrical consistency verification.
Q5. Can analysis still be conducted with a limited number of samples?
A. Yes. Most key analysis techniques support micro-area point sampling, allowing for structural and failure localization to be completed without the need for a large number of samples.

Chip internal defect localization

Electrical Failure Analysis

Sign Up
01.16
2026
This seminar is themed "Silicon Exploration of the Future: The Intelligence Quest of AI × Silicon Photonics," emphasizing how the integration of AI, high-speed computing, silicon photonics, and advanced packaging technology redefines computing efficiency. The concept of "Intelligence Quest" symbolizes the identification and analysis of the best opportunities for future technological development through these key technologies.
For more information: https://www.matek.com/zh-TW/Seminar/detail/all/20250327
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