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IC Design

An integrated circuit (IC) integrates a large number of electronic components (such as transistors, resistors, capacitors, etc.) onto a silicon substrate through miniaturization and layout techniques, allowing the chip to perform high-speed computing, data processing, or control functions in a very small area.

IC design is the process of establishing circuit architecture, logical behavior, and physical layout based on product functionality, performance requirements, power consumption targets, and process specifications, ultimately outputting design files (such as GDS) that can be used for wafer manufacturing. As semiconductor processes advance to 7nm, 5nm, 3nm, and more advanced nodes, along with the rapid maturation of heterogeneous integration, Chiplet, 2.5D/3D IC, and advanced packaging technologies, the scope of IC design is no longer limited to the circuit logic itself, but must also consider:

 

1. Process feasibility of materials and structures

2. Stacking of metal layers, dielectric layers, and wiring density

3. Signal Integrity (SI), Power Integrity (PI), and Thermal Design

4. The impact of packaging and system integration on performance and lifespan

5. Long-term reliability and performance degradation under operating environment

 

Therefore, IC design needs to achieve a balance between performance, power consumption, size, cost, and reliability, and ensure that the chip can maintain the expected electrical characteristics and operational behavior after entering manufacturing and packaging.

 

Application Examples

Applicable service items
Service Categories Analysis/Test Can confirm/Can locate content MA-tek provides technology
Material and Structural Analysis (MA) Verify whether the chip structure meets design and process requirements. metal layer thickness, dielectric layer morphology, wiring density, via/contact structure, interface quality TEM, STEM, FIB, SEM, EDS, EELS

Failure Analysis

(FA)

Identify the sources of open circuit, short circuit, or abnormal electrical characteristics. via void, crack, metal migration, electrical leakage, interface separation, stress effects caused by packaging OBIRCH、TIVA、X-ray、SAM、Decap、Passive Probe

Reliability verification

(RA)

Evaluate the lifespan and stability of chips in the usage environment. metal migration, dielectric layer breakdown, thermal aging, mechanical fatigue, packaging thermal stress effects HTOL, EM, TDDB, BTI, TC, HAST, HTS
Frequently Asked Questions
Q1. Why is the yield inconsistent with expectations after tape-out?
A. There may be differences between the design model, process conditions, and material properties, leading to open circuits, short circuits, or leakage in the metal layers, dielectric layers, or contact structures. To determine the source of the anomalies, precise localization and analysis of the internal structure and interface conditions of the chip are required.
Q2. Why does the electrical performance of the chip differ after packaging compared to the design phase?
A. The RDL, bump, underfill, soldering conditions, and thermal distribution after packaging may change the internal stress, signal delay, and power integrity of the chip, resulting in measurement values that differ from those in the design phase. Therefore, it is necessary to compare the structural differences before and after packaging to confirm whether the interface degradation or wiring structure is affected by packaging materials or processes.
Q3. How to confirm the cause of performance degradation after long-term use of the chip?
A. Chip performance degradation is often related to metal migration, dielectric layer aging, thermal cycling fatigue, and interface stress accumulation. It is necessary to quantify the degradation process through accelerated life testing and compare the structures before and after to establish the degradation mechanism.
Q4. How to avoid performance differences when switching between different process manufacturers or process versions?
A. Differences in material sources, processing parameters, and equipment conditions may cause electrical inconsistencies, especially in advanced processes or multi-site supply chain collaborations. It is necessary to ensure cross-factory/cross-batch reproducibility through structural and electrical consistency verification.
Q5. Can analysis still be conducted with a small sample size?
A. Yes. Most key analysis techniques support micro-area point sampling, allowing for structural and failure localization without the need for a large number of samples.

Chip internal defect localization

Electrical Failure Analysis

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