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SIMS Secondary Ion Mass Spectrometer

Secondary Ion Mass Spectrometry (SIMS) is a highly sensitive surface and depth composition analysis technique that can resolve the distribution, concentration changes, and chemical states of elements from the surface of materials to a depth of micrometers at the nanoscale. Its principle involves bombarding the sample surface with a high-energy ion beam, causing the sample to release "secondary ions," which are then analyzed by a mass spectrometry system to determine the mass-to-charge ratio (m/z) to identify the presence and concentration of various elements and chemical species. SIMS is like a "microscope that can see through the texture of materials," revealing trace elements and impurity distributions that conventional observation methods cannot detect.
The analysis methods of secondary ion mass spectrometry are as follows: three types.
Surface mass spectrometry analysis (mass spectrum)
Obtain the mass distribution map of the ions for qualitative or quantitative analysis.
Surface Imaging Analysis (ion image)
Establishing a spatial distribution image of elements or ions on the surface of the sample.
depth profile
Tracking the concentration changes of elements or impurities from the surface to the bottom.
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01.16
2026
This seminar is themed "Silicon Exploration of the Future: The Intelligence Quest of AI × Silicon Photonics," emphasizing how the integration of AI, high-speed computing, silicon photonics, and advanced packaging technology redefines computing efficiency. The concept of "Intelligence Quest" symbolizes the identification and analysis of the best opportunities for future technological development through these key technologies.
For more information: https://www.matek.com/zh-TW/Seminar/detail/all/20250327
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