XPS X-ray Photoelectron Spectrometer
X-ray Photoelectron Spectroscopy (XPSis a highly sensitive surface analysis technique used to measure the surface of materials.element composition and chemical bonding state,When the surface of the material is irradiated with X-rays, it will producephotoelectric effectThe inner orbital electrons of the material are excited and released as photoelectrons, which can be measured by an energy analyzer to obtain theirbinding energy spectrumDue to different elements and different electron orbitals having specific binding energies, it is possible to determine through the energy spectrum:element types,element ratio,Chemical bonding state.
In addition, when elements form chemical bonds with different elements, their electron binding energy will producechemical shift,For example, the higher the degree of metal oxidation, the higher the binding energy usually is, so this characteristic can be used to analyze the material'sChemical state and oxidation state,XPS mainly measures the surface of materials about1–10 nm depth rangethe elements and chemical information, therefore it is very suitable forSurface chemical analysis and thin film material research。
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XPS/ESCA (Thermo K-alpha, K-alpha+)
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XPS/ESCA (ESCALAB Xi+)
- The spatial resolution for micro-area analysis can reach 5 µm.
- Photoelectron imaging provides precise positioning analysis.
- The molecular ion gun can reduce sample damage caused by ion etching.
- Comprehensive spectral distribution analysis aids in the identification of unknown substances.
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(a) Parallel Image
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(b) Spectrum for Interested Area
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(c) Cluster-cleaned Prevent Ta Reduction
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(d) Depth profile by using MAGCIS
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(a) Adhesion failure issue
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(b) Identification of photo resist residue
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(c) Surface contamination
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(d) Depth profiling
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(e) Work function
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